High-resolution infrared spectroscopy for in situ industrial process monitoring

Philip Martin^a,c and Robert Holdsworth^b

^aDepartment of Chemical Engineering, UMIST, PO Box 88, Manchester M60 1QD, UK. E-mail: [email protected]
^bTDL Sensors Ltd, UVL, 70–72 Sackville Street, Manchester, UK. E-mail: [email protected]
^cFrom 1 October 2004, School of Chemical Engineering and Analytical Science, University of Manchester